Báo cáo hóa học: Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin film
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Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin film
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Báo cáo hóa học: " Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin film"Debieu et al. Nanoscale Research Letters 2011, 6:161http://www.nanoscalereslett.com/content/6/1/161 NANO EXPRESS Open AccessEffect of the Nd content on the structural andphotoluminescence properties of silicon-richsilicon dioxide thin filmsOlivier Debieu, Julien Cardin, Xavier Portier, Fabrice Gourbilleau* Abstract In this article, the microstructure and photoluminescence (PL) properties of Nd-doped silicon-rich silicon oxide (SRSO) are reported as a function of the annealing temperature and the Nd concentration. The thin films, which were grown on Si substrates by reactive magnetron co-sputtering, contain the same Si excess as determined by Rutherford backscattering spectrometry. Fourier transform infrared (FTIR) spectra show that a phase separation occurs during the annealing because of the condensation of the Si excess resulting in the formation of silicon nanoparticles (Si-np) as detected by high-resolution transmission electron microscopy and X-ray diffraction (XRD) measurements. Under non-resonant excitation at 488 nm, our Nd-doped SRSO films simultaneously exhibited PL from Si-np and Nd3+ demonstrating the efficient energy transfer between Si-np and Nd3+ and the sensitizing effect of Si-np. Upon increasing the Nd concentration from 0.08 to 4.9 at.%, our samples revealed a progressive quenching of the Nd3+ PL which can be correlated with the concomitant increase of disorder within the host matrix as shown by FTIR experiments. Moreover, the presence of Nd-oxide nanocrystals in the highest Nd-doped sample was established by XRD. It is, therefore, suggested that the Nd clustering, as well as disorder, are responsible for the concentration quenching of the PL of Nd3+.Introduction energy transfer mechanism, which enables the PL effi-Over the last decade, there has been an increasing inter- ciency of RE ions to be enhanced by 3-4 orders of mag-est toward nanomaterials for novel applications. One of nitude offering interesting opportunities for thethe challenging fields concerns silicon-compatible light achievement of future practical devices optically excited. In contrast to Er3+ ions [6-8], such materials doped withsources which are getting more and more attractivesince they can be integrated to microelectronics devices Nd have not been widely investigated and, accordingly, the energy transfer mechanism between Si-np and Nd3+[1]. Amorphous SiO 2 is an inefficient host matrix forthe photoluminescence (PL) of Nd3+ ions since, on the ions, and its limitation [9-16]. Several authors haveone hand, the absorption cross section of Nd is low (1 × demonstrated that the energy transfer is more effective10-20 cm2) and, on the other hand, the Nd solubility in with small Si-np [10,11]. Seo et al. [11] have observed a decrease of the PL intensity of Nd3+ ions upon increas-silica is limited by clustering [2 ,3], which quenches thePL of the rare earth (RE) ions [4,5]. However, since the ing the Si excess, i.e., increasing the Si-np average size.discovery of the sensitizing effect of silicon nanoparticles They concluded that only small Si-np which present(Si-np) toward the RE ions [6], RE-doped a-SiO2 films excitonic states with a sufficient energy band-gap can excite the 4F3/2 level of Nd3+ ions. Several groups, whichcontaining Si-np are promising candidates for theachievement of future photonic devices. In such nano- studied the effect of the Nd concentration in the PLcomposites, Nd3+ ions benefit from the high absorption properties of Nd-doped Si-np/SiO 2 demonstratedcross section of Si-np (1-100 × 10-17 cm2) by an efficient that the PL of Nd 3+ ions is more efficient at low Nd concentration [12,13]. The object of the present investigation is therefore to* Correspondence: fabrice.gourbilleau@ensic ...
Nội dung trích xuất từ tài liệu:
Báo cáo hóa học: " Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin film"Debieu et al. Nanoscale Research Letters 2011, 6:161http://www.nanoscalereslett.com/content/6/1/161 NANO EXPRESS Open AccessEffect of the Nd content on the structural andphotoluminescence properties of silicon-richsilicon dioxide thin filmsOlivier Debieu, Julien Cardin, Xavier Portier, Fabrice Gourbilleau* Abstract In this article, the microstructure and photoluminescence (PL) properties of Nd-doped silicon-rich silicon oxide (SRSO) are reported as a function of the annealing temperature and the Nd concentration. The thin films, which were grown on Si substrates by reactive magnetron co-sputtering, contain the same Si excess as determined by Rutherford backscattering spectrometry. Fourier transform infrared (FTIR) spectra show that a phase separation occurs during the annealing because of the condensation of the Si excess resulting in the formation of silicon nanoparticles (Si-np) as detected by high-resolution transmission electron microscopy and X-ray diffraction (XRD) measurements. Under non-resonant excitation at 488 nm, our Nd-doped SRSO films simultaneously exhibited PL from Si-np and Nd3+ demonstrating the efficient energy transfer between Si-np and Nd3+ and the sensitizing effect of Si-np. Upon increasing the Nd concentration from 0.08 to 4.9 at.%, our samples revealed a progressive quenching of the Nd3+ PL which can be correlated with the concomitant increase of disorder within the host matrix as shown by FTIR experiments. Moreover, the presence of Nd-oxide nanocrystals in the highest Nd-doped sample was established by XRD. It is, therefore, suggested that the Nd clustering, as well as disorder, are responsible for the concentration quenching of the PL of Nd3+.Introduction energy transfer mechanism, which enables the PL effi-Over the last decade, there has been an increasing inter- ciency of RE ions to be enhanced by 3-4 orders of mag-est toward nanomaterials for novel applications. One of nitude offering interesting opportunities for thethe challenging fields concerns silicon-compatible light achievement of future practical devices optically excited. In contrast to Er3+ ions [6-8], such materials doped withsources which are getting more and more attractivesince they can be integrated to microelectronics devices Nd have not been widely investigated and, accordingly, the energy transfer mechanism between Si-np and Nd3+[1]. Amorphous SiO 2 is an inefficient host matrix forthe photoluminescence (PL) of Nd3+ ions since, on the ions, and its limitation [9-16]. Several authors haveone hand, the absorption cross section of Nd is low (1 × demonstrated that the energy transfer is more effective10-20 cm2) and, on the other hand, the Nd solubility in with small Si-np [10,11]. Seo et al. [11] have observed a decrease of the PL intensity of Nd3+ ions upon increas-silica is limited by clustering [2 ,3], which quenches thePL of the rare earth (RE) ions [4,5]. However, since the ing the Si excess, i.e., increasing the Si-np average size.discovery of the sensitizing effect of silicon nanoparticles They concluded that only small Si-np which present(Si-np) toward the RE ions [6], RE-doped a-SiO2 films excitonic states with a sufficient energy band-gap can excite the 4F3/2 level of Nd3+ ions. Several groups, whichcontaining Si-np are promising candidates for theachievement of future photonic devices. In such nano- studied the effect of the Nd concentration in the PLcomposites, Nd3+ ions benefit from the high absorption properties of Nd-doped Si-np/SiO 2 demonstratedcross section of Si-np (1-100 × 10-17 cm2) by an efficient that the PL of Nd 3+ ions is more efficient at low Nd concentration [12,13]. The object of the present investigation is therefore to* Correspondence: fabrice.gourbilleau@ensic ...
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