Báo cáo hóa học: Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography
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Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography
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Báo cáo hóa học: " Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography"Jung and Lee Nanoscale Research Letters 2011, 6:159http://www.nanoscalereslett.com/content/6/1/159 NANO EXPRESS Open AccessSelective patterning of ZnO nanorods on siliconsubstrates using nanoimprint lithographyMi-Hee Jung1, Hyoyoung Lee2* Abstract In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self- assembled monolayers (SAMs) on SiO2 substrate was prepared by the polymer mask using NI. The ZnO seed layer was selectively coated only on the hydrophilic SiO2 surface, not on the hydrophobic OTS SAMs surface. The substrate patterned with the ZnO seed layer was treated with the oxygen plasma to oxidize the silicon surface. It was found that the nucleation and initial growth of the crystalline ZnO were proceeded only on the ZnO seed layer, not on the silicon oxide surface. ZnO photoluminescence spectra showed that ZnO nanorods grown from the seed layer treated with plasma showed lower intensity than those untreated with plasma at 378 nm, but higher intensity at 605 nm. It is indicated that the seed layer treated with plasma produced ZnO nanorods that had a more oxygen vacancy than those grown from seed layer untreated with plasma. Since the oxygen vacancies on ZnO nanorods serve as strong binding sites for absorption of various organic and inorganic molecules. Consequently, a nano-patterning of the crystalline ZnO nanorods grown from the seed layer treated with plasma may give the versatile applications for the electronics devices.Introduction substrates. As a result, the patterned growth of aligned ZnO nanorods has been conducted on expensive sub-Zinc oxide (ZnO) nanorods have been widely investi- strates, including GaN, SiC, and sapphire [2]. Thus massgated in applications such as ultraviolet nanolaser production of high-quality-patterned ZnO nanorods atsources, gas sensors, solar cells, and field emission dis- low cost is still a challenge.play devices because they have a direct band gap of 3.37 Until now, wet chemical processing among the variouseV and a large exciton binding energy of 60 meV. As methods is desirable due to the relatively low processingvarious applications of nanostructured materials, it is cost with merits of low growth temperature, economicalvery important not only to synthesize the ZnO nanorods synthesis, and good potential for scale-up when com-with a high degree of regularity and uniformity in terms pared with the VLS method. Recently, a solutionof diameter and length, but also to accurately position method for patterning the ZnO nanorods using the self-them in arrays. assembled monolayer (SAM) template was reported. Traditionally, the aligned growth of ZnO nanorods has Julia et al. [3] demonstrated the direct growth of thebeen successfully achieved on solid substrates via a ZnO nanorods on silver films from aqueous solutionvapor-liquid-solid (VLS) process with the use of gold using the organic template because the ZnO nucleationand tin as catalysts [1]. The VLS process may risk intro- was inhibited through appropriate complexation withducing catalyst residual atoms into the ZnO nanorods, the carboxylate end groups of ω-alkanethiol SAM mole-which is incompatible with silicon technology and addi- cules on the silver substrate. Koumoto et al. [4] reportedtionally requires heat treatment at high temperatures, that pre-patterned SAMs of a hydrophobic end groupwhich can damage substances already present on the led effectively to pattern a ZnO nanocrystal. Nanoimprint lithography (NIL) has a high throughput* Correspondence: hyoyoung@skku.edu and low-cost process and is well-suited for mass pro-2 National Creative Research Initiative, Center for Smart Molecula ...
Nội dung trích xuất từ tài liệu:
Báo cáo hóa học: " Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography"Jung and Lee Nanoscale Research Letters 2011, 6:159http://www.nanoscalereslett.com/content/6/1/159 NANO EXPRESS Open AccessSelective patterning of ZnO nanorods on siliconsubstrates using nanoimprint lithographyMi-Hee Jung1, Hyoyoung Lee2* Abstract In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self- assembled monolayers (SAMs) on SiO2 substrate was prepared by the polymer mask using NI. The ZnO seed layer was selectively coated only on the hydrophilic SiO2 surface, not on the hydrophobic OTS SAMs surface. The substrate patterned with the ZnO seed layer was treated with the oxygen plasma to oxidize the silicon surface. It was found that the nucleation and initial growth of the crystalline ZnO were proceeded only on the ZnO seed layer, not on the silicon oxide surface. ZnO photoluminescence spectra showed that ZnO nanorods grown from the seed layer treated with plasma showed lower intensity than those untreated with plasma at 378 nm, but higher intensity at 605 nm. It is indicated that the seed layer treated with plasma produced ZnO nanorods that had a more oxygen vacancy than those grown from seed layer untreated with plasma. Since the oxygen vacancies on ZnO nanorods serve as strong binding sites for absorption of various organic and inorganic molecules. Consequently, a nano-patterning of the crystalline ZnO nanorods grown from the seed layer treated with plasma may give the versatile applications for the electronics devices.Introduction substrates. As a result, the patterned growth of aligned ZnO nanorods has been conducted on expensive sub-Zinc oxide (ZnO) nanorods have been widely investi- strates, including GaN, SiC, and sapphire [2]. Thus massgated in applications such as ultraviolet nanolaser production of high-quality-patterned ZnO nanorods atsources, gas sensors, solar cells, and field emission dis- low cost is still a challenge.play devices because they have a direct band gap of 3.37 Until now, wet chemical processing among the variouseV and a large exciton binding energy of 60 meV. As methods is desirable due to the relatively low processingvarious applications of nanostructured materials, it is cost with merits of low growth temperature, economicalvery important not only to synthesize the ZnO nanorods synthesis, and good potential for scale-up when com-with a high degree of regularity and uniformity in terms pared with the VLS method. Recently, a solutionof diameter and length, but also to accurately position method for patterning the ZnO nanorods using the self-them in arrays. assembled monolayer (SAM) template was reported. Traditionally, the aligned growth of ZnO nanorods has Julia et al. [3] demonstrated the direct growth of thebeen successfully achieved on solid substrates via a ZnO nanorods on silver films from aqueous solutionvapor-liquid-solid (VLS) process with the use of gold using the organic template because the ZnO nucleationand tin as catalysts [1]. The VLS process may risk intro- was inhibited through appropriate complexation withducing catalyst residual atoms into the ZnO nanorods, the carboxylate end groups of ω-alkanethiol SAM mole-which is incompatible with silicon technology and addi- cules on the silver substrate. Koumoto et al. [4] reportedtionally requires heat treatment at high temperatures, that pre-patterned SAMs of a hydrophobic end groupwhich can damage substances already present on the led effectively to pattern a ZnO nanocrystal. Nanoimprint lithography (NIL) has a high throughput* Correspondence: hyoyoung@skku.edu and low-cost process and is well-suited for mass pro-2 National Creative Research Initiative, Center for Smart Molecula ...
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