Si nanowires grown by Al-catalyzed plasma-enhanced chemical vapor deposition (PECVD) on quartz substrates for solar cell applications
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In this work, we have use a plasma-enhanced chemical vapor deposition process (PECVD) to grow the SiNWs from Al thin films directly deposited on quartz substrates, the Al-catalyzed SiNWs thus obtained have been characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and electrical measurements, including field- effect transistor evaluations.
Nội dung trích xuất từ tài liệu:
Si nanowires grown by Al-catalyzed plasma-enhanced chemical vapor deposition (PECVD) on quartz substrates for solar cell applications
Nội dung trích xuất từ tài liệu:
Si nanowires grown by Al-catalyzed plasma-enhanced chemical vapor deposition (PECVD) on quartz substrates for solar cell applications
Tìm kiếm theo từ khóa liên quan:
Silicon nanowires Solar cells Al-catalyzed SiNWs Scanning electron microscopy Transmission electron microscopy Electrical measurementsGợi ý tài liệu liên quan:
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